MORPHOLOGY OF HYDROGENATED AMORPHOUS-SILICON FILMS BY PHOTOCHEMICAL VAPOR-DEPOSITION

被引:4
作者
MUTSUKURA, N
MACHI, Y
机构
关键词
D O I
10.1063/1.96501
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:544 / 545
页数:2
相关论文
共 8 条
  • [1] PHOTOENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION OF ZNSE FILMS USING DIETHYLZINC AND DIMETHYLSELENIDE
    ANDO, H
    INUZUKA, H
    KONAGAI, M
    TAKAHASHI, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (02) : 802 - 805
  • [2] AMORPHOUS SILICON SOLAR-CELL
    CARLSON, DE
    WRONSKI, CR
    [J]. APPLIED PHYSICS LETTERS, 1976, 28 (11) : 671 - 673
  • [3] AMORPHOUS-SILICON THIN-FILM METAL-OXIDE-SEMICONDUCTOR TRANSISTORS
    HAYAMA, H
    MATSUMURA, M
    [J]. APPLIED PHYSICS LETTERS, 1980, 36 (09) : 754 - 755
  • [4] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS
    KNIGHTS, JC
    LUJAN, RA
    [J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 244 - 246
  • [5] EPITAXIAL GROWTH WITH LIGHT IRRADIATION
    KUMAGAWA, M
    SUNAMI, H
    TERASAKI, T
    NISHIZAWA, JI
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (11) : 1332 - +
  • [6] SILICON THIN-FILM FORMATION BY DIRECT PHOTOCHEMICAL DECOMPOSITION OF DISILANE
    MISHIMA, Y
    HIROSE, M
    OSAKA, Y
    NAGAMINE, K
    ASHIDA, Y
    KITAGAWA, N
    ISOGAYA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1983, 22 (01): : L46 - L48
  • [7] PETERS JW, 1981, P INT C IEEE IEDM, P240
  • [8] A-SI THIN-FILM AS A PHOTO-RECEPTOR FOR ELECTROPHOTOGRAPHY
    SHIMIZU, I
    KOMATSU, T
    SAITO, K
    INOUE, E
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 773 - 778