INSITU OBSERVATION OF CHEMICAL VAPOR-DEPOSITED TITANIUM-OXIDE FILMS BY DOUBLE-MODULATION INFRARED-EMISSION SPECTROMETRY

Double-modulation infrared emission spectrometry was applied to the in situ observation of titanium oxide films grown on gold substrates from a mixture of tetraisopropoxytitanium and oxygen under controlled gaseous pressure and substrate temperature. The emission band associated with the formation of Ti-O bonds shifts continuously towards higher frequencies with deposition time over the range 870-920 cm-1. Structures of the films are discussed through a comparison between the observed and calculated emission spectra and by x-ray diffraction analysis. It was found that the film growth is relatively slow in the early stage of the deposition. Further, it is shown that UV illumination facilitates the growth of the film. Some possibilities for this origin are discussed.