PULSED ELECTROMAGNETIC INDUCTIVE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION OF AMORPHOUS-CARBON FILMS

被引：4

作者：

EBIHARA, K

KANAZAWA, S

YAMAGATA, Y

MAEDA, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 03期

关键词：

D O I：

10.1063/1.341816

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1440 / 1445

页数：6

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