PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF EPITAXIAL MERCURY TELLURIDE

被引：9

作者：

WILLIAMS, LM

LU, PY

WANG, CH

PARSEY, JM

CHU, SNG

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 21期

关键词：

D O I：

10.1063/1.98508

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1738 / 1740

页数：3

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