CHARACTERIZATION OF THIN-FILMS OF BISMUTH OXIDE BY X-RAY PHOTO-ELECTRON SPECTROSCOPY

被引:218
作者
DHARMADHIKARI, VS [1 ]
SAINKAR, SR [1 ]
BADRINARAYAN, S [1 ]
GOSWAMI, A [1 ]
机构
[1] NATL CHEM LAB,POONA 411008,MAHARASHTRA,INDIA
关键词
D O I
10.1016/0368-2048(82)85016-0
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
引用
收藏
页码:181 / 189
页数:9
相关论文
共 34 条
[31]   OXIDE-FILMS ON SPUTTERED TIN-NICKEL ALLOY EXPOSED TO PURE OXYGEN AND AIR [J].
SHARMA, SP ;
THOMAS, JH .
ANALYTICAL CHEMISTRY, 1977, 49 (07) :987-990
[32]  
SOMILETOV SA, 1955, ZH TEKH FIZ, V25, P2336
[33]   TIME-DEPENDENCE OF CHEMICAL COMPOSITION OF SURFACE FILM ON METASTABLE TIN-NICKEL ALLOY STUDIED WITH X-RAY PHOTOELECTRON-SPECTROSCOPY [J].
TOMPKINS, HG ;
WERTHEIM, GK ;
SHARMA, SP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (01) :20-23
[34]  
ZAVYALOVA AA, 1965, SOV PHYS-CRYSTALLOGR, V10, P401