CORROSION-RESISTANT MULTIPLE LAYER THIN OXIDE-FILMS PREPARED BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:5
作者
ISHIKAWA, M
SUGIMOTO, K
机构
关键词
D O I
10.2320/jinstmet1952.51.11_1054
中图分类号
学科分类号
摘要
引用
收藏
页码:1054 / 1059
页数:6
相关论文
共 7 条
[1]   SEMICONDUCTOR ELECTRODES .1. CHEMICAL VAPOR-DEPOSITION AND APPLICATION OF POLYCRYSTALLINE N-TYPE TITANIUM-DIOXIDE ELECTRODES TO PHOTOSENSITIZED ELECTROLYSIS OF WATER [J].
HARDEE, KL ;
BARD, AJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (06) :739-742
[2]  
HAYFIELD P, 1972, ADV CORROSION SCIENC, V2, P43
[3]  
KRUGER J, 1971, HDB CORROSION TESTIN, P783
[4]  
OKAMOTO G, 1978, PASSIVITY METALS, P646
[5]  
TOWNSEND HE, 1981, CORROSION, V37, P384
[6]  
Yee K. K., 1978, International Metals Reviews, V23, P19
[7]   A SIMPLE CHEMICAL VAPOR-DEPOSITION METHOD FOR DEPOSITING THIN TIO2 FILMS [J].
YEUNG, KS ;
LAM, YW .
THIN SOLID FILMS, 1983, 109 (02) :169-178