INFLUENCE OF THE BASIC PROCESS PARAMETERS ON THE ION ATOM ARRIVAL RATE RATIO DURING MAGNETRON SPUTTER DEPOSITION OF THIN CARBON-FILMS

被引：12

作者：

PETROV, I

ORLINOV, V

IVANOV, I

KOURTEV, J

机构：

来源：

CONTRIBUTIONS TO PLASMA PHYSICS | 1988年 / 28卷 / 03期

关键词：

D O I：

10.1002/ctpp.2150280309

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

引用

页码：265 / 273

页数：9

共 15 条

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[4]

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[8]

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[9]

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[10]

Petrov I. G., 1986, Bulgarian Journal of Physics, V13, P273

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