PHOTOCHEMICALLY GENERATED GOLD CATALYST FOR SELECTIVE ELECTROLESS PLATING OF COPPER

被引:16
作者
BAUM, TH
机构
[1] IBM Almaden Research Center, San Jose, California
关键词
Electroless Plating;
D O I
10.1149/1.2086377
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The creation of surface-selective copper patterns was explored via the photochemical decomposition of dimethyl (1,3-diphenyl-l,3-propanedionato) gold. UV irradiation of a substrate treated with the gold complex results in the formation of elemental gold, which in turn catalyzes copper metal plating from an electroless bath. Thus, a selective copper pattern can be formed in a simplified process as defined by patterned UV irradiation. The variables which are important to the process are discussed including the UV dose, wavelength, and the surface concentration of gold complex. © 1990, The Electrochemical Society, Inc. All rights reserved.
引用
收藏
页码:252 / 255
页数:4
相关论文
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