CHANNELING CONTRAST MICROSCOPY - APPLICATION TO SEMICONDUCTOR STRUCTURES

被引：26

作者：

MCCALLUM, JC ^{[1
]}

MCKENZIE, CD ^{[1
]}

LUCAS, MA ^{[1
]}

ROSSITER, KG ^{[1
]}

SHORT, KT ^{[1
]}

WILLIAMS, JS ^{[1
]}

机构：

[1] ROYAL MELBOURNE INST TECHNOL,DEPT COMMUN & ELECTR ENGN,MELBOURNE,VIC 3000,AUSTRALIA

来源：

关键词：

D O I：

10.1063/1.94108

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：827 / 829

页数：3

共 12 条

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[2] Chu WK., 1978, BACKSCATTERING SPECT
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[4] SEMICONDUCTOR ANALYSIS WITH A CHANNELED HELIUM MICROBEAM
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[5] MELBOURNE PROTON MICROPROBE
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[J]. APPLIED PHYSICS LETTERS, 1979, 35 (07) : 532 - 534
[7] MAYER JW, 1977, ION BEAM HDB MATERIA
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[9] SOLID SOLUBILITIES OF IMPURITY ELEMENTS IN GERMANIUM AND SILICON
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[10] WIGGERS LW, 1979, RAD EFF, V45, P162