PROSPECTS IN HIGH-RESOLUTION X-RAY PHOTOELECTRON MICROSCOPY

被引：4

作者：

CAZAUX, J

机构：

[1] Laboratoire de Spectroscopie Electronique, Faculte des Sciences de Reims, F 51062 Reims Cedex, France

来源：

ULTRAMICROSCOPY | 1985年 / 17卷 / 01期

关键词：

MICROSCOPIC EXAMINATION - Imaging Techniques;

D O I：

10.1016/0304-3991(85)90175-5

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

After a brief review of the present state of the art in X-ray photoelectron microscopy, the prospects to improve the nominal value of the spatial resolution are described. Progress in this method is also related to the development of dense X-ray sources, but possible radiation damage effects have to be considered.

引用

页码：43 / 49

页数：7

共 13 条

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