CALCULATION OF ONE-DIMENSIONAL LITHOGRAPHIC AERIAL IMAGES USING THE VECTOR THEORY

被引：16

作者：

YUAN, CM ^{[1
]}

机构：

[1] IBM CORP,E FISHKILL FACIL,HOPEWELL JCT,NY 12533

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1993年 / 40卷 / 09期

关键词：

D O I：

10.1109/16.231565

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The scalar diffraction theory has been extensively used to calculate 1D and 2D photolithographic aerial images of integrated circuit patterns. In this paper, the vector theory is developed and employed to calculate 1D aerial images by numerically solving the Maxwell's equations to account for the scattering effect from realistic mask structures. Comparisons of results from the scalar and vector theories are made for conventional chrome mask and various phase shifting masks to show the differences of these two theories.

引用

页码：1604 / 1613

页数：10

共 18 条

[1]

Born M., 1980, PRINCIPLES OPTICS, P524

[2] DIFFRACTION OF A PLANE WAVE AT A SINUSOIDALLY STRATIFIED DIELECTRIC GRATING [J].