THE GROWTH OF GERMANIUM OXIDE ON THIN GOLD LAYERS ON GERMANIUM SUBSTRATES

被引:4
作者
LAWSON, EM
TAVENDALE, AJ
机构
[1] Applied Physics Division, Australian Atomic Energy Commission, Lucas Heights Research Laboratories, Private Mailbag, Sutherland, NSW 2232, Australia
关键词
D O I
10.1063/1.330479
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:8771 / 8774
页数:4
相关论文
共 3 条
[1]  
EWINS J, 1974, T NUCL SCI NS, V21, P370
[2]  
HANSEN M, 1958, CONSTITUTION BINARY, P206
[3]   FORMATION OF SILICON OXIDE OVER GOLD LAYERS ON SILICON SUBSTRATES [J].
HIRAKI, A ;
MAYER, JW ;
LUGUJJO, E .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (09) :3643-&