INVESTIGATIONS OF TIO2 FILMS DEPOSITED BY DIFFERENT TECHNIQUES

被引：179

作者：

BANGE, K

OTTERMANN, CR

ANDERSON, O

JESCHKOWSKI, U

LAUBE, M

FEILE, R

机构：

[1] UNIV FRANKFURT,INST KERNPHYS,W-6000 FRANKFURT 90,GERMANY

[2] UNIV MAINZ,INST PHYS,W-6500 MAINZ,GERMANY

来源：

THIN SOLID FILMS | 1991年 / 197卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(91)90238-S

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High refractive TiO2 films deposited by reactive electron beam evaporation, reactive ion plating and dip coating have been characterized by optical spectroscopy, electron spectroscopy for chemical analysis, Rutherford backscattering spectroscopy, nuclear reaction analysis and Raman spectroscopy. The spectral refractive index n exhibits a strong dependence on the deposition conditions. These findings will be connected to variations in density, stoichiometry, hydrogen content (H2O) and binding structure of the layers. A strong correlation is found between optical quantities and microscopic properties of TiO2 films.

引用

页码：279 / 285

页数：7