ELECTRON LITHOGRAPHY FOR THE FABRICATION OF MICROELECTRONIC DEVICES

[1] ABRAHAM HE, 1983, HEWLETT-PACKARD J, V34, P34

[2] AIZAKI N, 1979, JPN J APPL PHYS S18, V18, P319

[3] DESIGN OF FAST DEFLECTION COILS FOR AN ELECTRON-BEAM MICROFABRICATION SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1152 - 1155

[4] BARTLETT K, 1983, P SOC PHOTO-OPT INST, V394, P49, DOI 10.1117/12.935121

[5] BEYERS JW, 1983, HEWLETT-PACKARD J, V34, P3

[6] ELECTRON SCATTERING IN THICK TARGETS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (06): : 703 - &

[7] Born M., 1975, PRINCIPLES OPTICS, VFifth

[8] Bowden M J, 1979, CRC CRIT R SOLID ST, V8, P223

[9] Broers A, 1965, MICROELECTRON RELIAB, V4, P103

[10] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598

[1] ABRAHAM HE, 1983, HEWLETT-PACKARD J, V34, P34

[2] AIZAKI N, 1979, JPN J APPL PHYS S18, V18, P319

[3] DESIGN OF FAST DEFLECTION COILS FOR AN ELECTRON-BEAM MICROFABRICATION SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1152 - 1155

[4] BARTLETT K, 1983, P SOC PHOTO-OPT INST, V394, P49, DOI 10.1117/12.935121

[5] BEYERS JW, 1983, HEWLETT-PACKARD J, V34, P3

[6] ELECTRON SCATTERING IN THICK TARGETS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (06): : 703 - &

[7] Born M., 1975, PRINCIPLES OPTICS, VFifth

[8] Bowden M J, 1979, CRC CRIT R SOLID ST, V8, P223

[9] Broers A, 1965, MICROELECTRON RELIAB, V4, P103

[10] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598