ON THE TEXTURE OF ELECTROLESS COPPER-FILMS

被引:34
作者
JUNGINGER, R
ELSNER, G
机构
关键词
D O I
10.1149/1.2096258
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:2304 / 2308
页数:5
相关论文
共 10 条
  • [1] EPELBOIN I, 1969, PLATING, V56, P1356
  • [2] GMELIN, 1955, HDB ANORG CHEM CU, P1403
  • [3] MICROSTRUCTURE EVOLUTION DURING ELECTROLESS COPPER DEPOSITION
    KIM, J
    WEN, SH
    JUNG, DY
    JOHNSON, RW
    [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1984, 28 (06) : 697 - 710
  • [4] KLUG HP, 1954, XRAY DIFFRACTION PRO
  • [5] LEE DN, 1974, J KOREAN I MET, V11, P243
  • [6] Pangarov N. A., 1964, ELECTROCHIM ACTA, V9, P721
  • [7] PANGAROV NA, 1963, B I PHYS CHEM SOFIA, V3, P133
  • [8] Pangrov, 1962, ELECTROCHIM ACTA, V7, P139, DOI DOI 10.1016/0013-4686(62)80023-1
  • [9] REEDHILL RE, 1973, PHYS METALLURGY PRIN, P577
  • [10] YE GC, 1981, PLAT SURF FINISH, V68, P60