INTERDIFFUSION AND STRUCTURAL RELAXATION IN MO/SI MULTILAYER FILMS

被引：64

作者：

NAKAJIMA, H ^{[1
]}

FUJIMORI, H ^{[1
]}

KOIWA, M ^{[1
]}

机构：

[1] KYOTO UNIV, DEPT MET SCI & TECHNOL, KYOTO 606, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 04期

关键词：

D O I：

10.1063/1.340005

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1046 / 1051

页数：6

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