CHARACTERIZATION OF ISOTHERMAL VAPOR-PHASE EPITAXIAL (HG, CD) TE

被引:12
作者
LEE, SB [1 ]
MAGEL, LK [1 ]
TANG, MFS [1 ]
STEVENSON, DA [1 ]
TREGILGAS, JH [1 ]
GOODWIN, MW [1 ]
STRONG, RL [1 ]
机构
[1] TEXAS INSTRUMENTS INC,DALLAS,TX 75265
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 02期
关键词
D O I
10.1116/1.576967
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report on the characterization of mercury cadmium telluride (Hg1-xCdxTe) film grown by the isothermal vapor phase epitaxial method (ISOVPE) and on the surface conversion of bulk Hg1-xCdxTe to larger bandgap material. The crystal perfection is evaluated using defect etching, electron beam and electrolyte electroreflectance (EBER and EER), and Rutherford backscattering spectrometry (RBS). Hall measurements are used to measure carrier densities and mobilities. Surface concentrations and concentration profiles are measured for the ISOVPE grown layers by transmission Fourier transform infrared spectroscopy (FTIR) and electron-probe microanalysis (EPMA) to establish quantitative informations about composition control. Metal-insulator-semiconductor (MIS) structures were made and the properties important to device performance such as compositional uniformity, storage time, and carrier concentration are measured. The ISOVPE layers are compared in quality to films grown by other methods and show promise for MIS devices. © 1990, American Vacuum Society. All rights reserved.
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页码:1098 / 1102
页数:5
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