HREM IMAGING AND MICROANALYSIS OF A III-V SEMICONDUCTOR OXIDE INTERFACE

被引：9

作者：

KRIVANEK, OL ^{[1
]}

FORTNER, SL ^{[1
]}

机构：

[1] ARIZONA STATE UNIV,DEPT PHYS,TEMPE,AZ 85287

来源：

ULTRAMICROSCOPY | 1984年 / 14卷 / 1-2期

关键词：

D O I：

10.1016/0304-3991(84)90115-3

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：121 / 126

页数：6

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