INITIAL GROWTH OF CU FILMS ON OXYGEN COVERED W(110)

被引：4

作者：

XU, H ^{[1
]}

YANG, YW ^{[1
]}

ENGEL, T ^{[1
]}

机构：

[1] UNIV WASHINGTON,SEATTLE,WA 98195

来源：

SURFACE SCIENCE | 1992年 / 275卷 / 03期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0039-6028(92)90788-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The growth of Cu films on the p(2 X 1)O-W(110) and (1 X 1)O-W(110) surfaces has been monitored using specular He scattering. Deposition at temperatures below 200 K leads to rough films on both surfaces. Deposition at T > 300 K leads to phase separation of Cu and O on the p(2 X 1)O-W(110) surface. Deposition at 300 K on the higher oxygen coverage surface leads to films which are nearly as smooth as these deposited on clean W(110). Deposition at 800 K leads to needle-like crystallite formation without an initial continuous film.

引用

页码：L707 / L710

页数：4

共 17 条

[11] ELECTRON-STIMULATED DESORPTION FROM CO AND O ADSORBED ON CLEAN AND CU COVERED W(110) SURFACES [J].

LIN, JC ;

GOMER, R .

SURFACE SCIENCE, 1989, 218 (2-3) :406-430

[12] THE EPITAXIAL-GROWTH OF ZIRCONIUM-OXIDE THIN-FILMS ON PT(111) SINGLE-CRYSTAL SURFACES [J].

MAURICE, V ;

SALMERON, M ;

SOMORJAI, GA .

SURFACE SCIENCE, 1990, 237 (1-3) :116-126

[13] SURFACE GEOMETRICAL STRUCTURE AND INCOMMENSURATE GROWTH - ULTRATHIN CU FILMS ON TIO2(110) [J].

MOLLER, PJ ;

WU, MC .

SURFACE SCIENCE, 1989, 224 (1-3) :265-276

[14]

NIEHUS H, 1975, SURF SCI, V47, P222, DOI 10.1016/0039-6028(75)90289-7

[15] METAL METAL-OXIDE INTERFACES - A SURFACE SCIENCE APPROACH TO THE STUDY OF ADHESION [J].

PEDEN, CHF ;

KIDD, KB ;

SHINN, ND .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :1518-1524

[16]

POELSEMA B, 1989, SPRINGER TRACTS MODE, V15

[17] QUANTIFICATION OF DEFECTS IN EPITAXIAL METAL-FILM GROWTH - A HELIUM DIFFRACTION INVESTIGATION OF THE CU/W(110) SYSTEM [J].

XU, H ;

YANG, YW ;

ENGEL, T .

SURFACE SCIENCE, 1991, 255 (1-2) :73-90

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