DIELECTRIC INSTABILITY AND BREAKDOWN IN WIDE BANDGAP INSULATORS

[11] Frohlich H., 1939, REP PROG PHYS, V6, P411, DOI [10.1088/0034-4885/6/1/326, DOI 10.1088/0034-4885/6/1/326]

[12] BREAKDOWN CHARACTERISTICS IN THIN SIO2 FILM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1974, 13 (07) : 1085 - 1092

[13] HIPPEL AV, 1938, PHYS REV, V54, P1096

[14] THEORY OF LOCALIZED ELECTRONIC BREAKDOWN IN INSULATING FILMS [J]. ADVANCES IN PHYSICS, 1972, 21 (92) : 605 - +

[15] ELECTRICAL BREAKDOWN IN THIN DIELECTRIC FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 963 - +

[16] KLEIN N, 1974, PRIVATE COMMUNICATIO

[17] KLEIN N, 1969, ADVAN ELECTRON ELECT, V26, P309

[18] FOWLER-NORDHEIM TUNNELING INTO THERMALLY GROWN SIO2 [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 278 - +

[19] LIGENZA JR, 1970, 138 M EL SOC ATL CIT

[20] CALCULATION OF ELECTRIC-FIELD BREAKDOWN IN QUARTZ AS DETERMINED BY DIELECTRIC DISPERSION ANALYSIS [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (08) : 3274 - &

[11] Frohlich H., 1939, REP PROG PHYS, V6, P411, DOI [10.1088/0034-4885/6/1/326, DOI 10.1088/0034-4885/6/1/326]

[12] BREAKDOWN CHARACTERISTICS IN THIN SIO2 FILM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1974, 13 (07) : 1085 - 1092

[13] HIPPEL AV, 1938, PHYS REV, V54, P1096

[14] THEORY OF LOCALIZED ELECTRONIC BREAKDOWN IN INSULATING FILMS [J]. ADVANCES IN PHYSICS, 1972, 21 (92) : 605 - +

[15] ELECTRICAL BREAKDOWN IN THIN DIELECTRIC FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 963 - +

[16] KLEIN N, 1974, PRIVATE COMMUNICATIO

[17] KLEIN N, 1969, ADVAN ELECTRON ELECT, V26, P309

[18] FOWLER-NORDHEIM TUNNELING INTO THERMALLY GROWN SIO2 [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 278 - +

[19] LIGENZA JR, 1970, 138 M EL SOC ATL CIT

[20] CALCULATION OF ELECTRIC-FIELD BREAKDOWN IN QUARTZ AS DETERMINED BY DIELECTRIC DISPERSION ANALYSIS [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (08) : 3274 - &