POLYMER INSULATING FILMS FOR CRYOTRON FABRICATION

被引：5

作者：

ALLAM, DS

STODDART, CT

STUART, PR

机构：

来源：

关键词：

D O I：

10.1016/0026-2714(66)90006-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：19 / &

共 18 条

ALLAM, DS ;

STUART, PR .

JOURNAL OF SCIENTIFIC INSTRUMENTS, 1965, 42 (11) :812-&

[2]

ALLAM DS, TO BE PUBLISHED

[3] ELECTRICAL PROPERTIES OF THIN ORGANIC FILMS [J].

BRADLEY, A ;

HAMMES, JP .

[4]

BUDO Y, 1965, SOLIDSTATE ELECTRON, V8, P479

CASWELL, HL .

[6] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT [J].

CHRISTY, RW .

[7] THE ORIGIN OF SPECIMEN CONTAMINATION IN THE ELECTRON MICROSCOPE [J].

ENNOS, AE .

BRITISH JOURNAL OF APPLIED PHYSICS, 1953, 4 (APR) :101-106

[8]

GLEED WL, TO BE PUBLISHED

[9]

GORRELL JH, 1964, PLAST TECHNOL, V10, P45

[10]

GREGOR LV, 1963, 5 P EL BEAM S BOST, P211