MICROSCOPIC X-RAY PHOTOELECTRON-SPECTROSCOPY USING A WOLTER TYPE X-RAY MIRROR

被引：7

作者：

NINOMIYA, K ^{[1
]}

HASEGAWA, M ^{[1
]}

AOKI, S ^{[1
]}

SUZUKI, K ^{[1
]}

机构：

[1] UNIV TSUKUBA,INST APPL PHYS,TSUKUBA,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11A期

关键词：

MU-XPS; SURFACE ANALYSIS; FOCUSED X-RAY; WOLTER TYPE MIRROR;

D O I：

10.1143/JJAP.30.2889

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The possibility of mu-XPS (microscopic X-ray photoelectron spectroscopy) analysis using a focused X-ray has been demonstrated in a synchrotron radiation beamline. A Wolter type mirror produced a focused 150 eV X-ray with a beam size ranging from 23(sagittal) x 36(meridional) mu-m2 to 1.4 x 20-mu-m2. The meridional beam size was always larger than the sagittal one due to the figure displacement of the mirror surface. When the focused beam was used for mu-XPS analysis of Si and Al samples, the Si(2p) and Al(2p) XPS spectra indicating native oxides on the sample surface could be clearly observed with energy resolutions of 1.7 to 2.8 eV. For practical mu-XPS analysis in the micrometer to sub-micrometer range, the fabrication accuracy of the mirror should be improved and the photon flux to the sample surface has to be increased.

引用

页码：2889 / 2894

页数：6

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