PHOTOMASK-PHOTORESIST TECHNIQUES FOR CRYOTRON FABRICATION

[1] AMES I, 1962, 9TH T NAT VAC S, P133

[2] BREMER JW, 1962, SUPERCONDUCTING DEVI

[3] BURNS LL, 1963, DDCASTIA422950 CRY M

[4] BURNS LL, 1963, P FALL JOINT COMPUTE, V40, P91

[5] CASWELL HL, 1960, ACR50 S REP OFF NAV, P262

[6] CASWELL HL, 1962, 9 T VAC S, P138

[7] CASWELL HL, 1964, IEEE SPECTRUM, V1, P84

[8] CHRISTY RW, 1960, ACR50 P S SUPER TECH, P186

[9] CRITTENDEN EC, 1959, P INTERNAT C STRUCTU, P282

[10] ENGLISH TD, 1964, P INTERMAY C, P2

[1] AMES I, 1962, 9TH T NAT VAC S, P133

[2] BREMER JW, 1962, SUPERCONDUCTING DEVI

[3] BURNS LL, 1963, DDCASTIA422950 CRY M

[4] BURNS LL, 1963, P FALL JOINT COMPUTE, V40, P91

[5] CASWELL HL, 1960, ACR50 S REP OFF NAV, P262

[6] CASWELL HL, 1962, 9 T VAC S, P138

[7] CASWELL HL, 1964, IEEE SPECTRUM, V1, P84

[8] CHRISTY RW, 1960, ACR50 P S SUPER TECH, P186

[9] CRITTENDEN EC, 1959, P INTERNAT C STRUCTU, P282

[10] ENGLISH TD, 1964, P INTERMAY C, P2