RADIO-FREQUENCY SPUTTERED COBALT OXIDE COATING - STRUCTURAL, OPTICAL, AND ELECTROCHEMICAL CHARACTERIZATION

被引：69

作者：

ESTRADA, W

FANTINI, MCA

DECASTRO, SC

DAFONSECA, CNP

GORENSTEIN, A

机构：

[1] USP, IF, BR-01498970 SAO PAULO, BRAZIL

[2] UNICAMP, IFGW, DFA, BR-13081 CAMPINAS, SP, BRAZIL

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 74卷 / 09期

关键词：

D O I：

10.1063/1.354203

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Cobalt oxide thin films (thickness 2000 angstrom) with different stoichiometries were deposited by reactive rf sputtering. The variation of the oxygen partial pressure lead to films with compositions varying from metallic cobalt to CO3O4, as determined by x-ray diffraction and x-ray photoelectron spectroscopy. The electrochromic properties of the films were investigated in aqueous electrolytes (0.1 M KOH). The initial electrochemical behavior of the films is strongly dependent on the film deposition conditions, but after cycling the electrochemical/electrochromic characteristics of the different deposits were quite similar. Transmittance changes and electrochromic efficiency are discussed.

引用

页码：5835 / 5841

页数：7

共 18 条

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