RF REACTIVE SPUTTER DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON CARBIDE FILMS

被引：23

作者：

GORANCHEV, B

REICHELT, K

CHEVALLIER, J

HORNSHOJ, P

DIMIGEN, H

HUBSCH, H

机构：

[1] FORSCHUNGSZENTRUM JULICH, INST FESTKORPERFORSCH, D-5170 JULICH 1, FED REP GER

[2] PHILIPS FORSCHUNGSLAB, D-2000 HAMBURG, FED REP GER

来源：

THIN SOLID FILMS | 1986年 / 139卷 / 03期

关键词：

D O I：

10.1016/0040-6090(86)90057-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：275 / 285

页数：11

共 18 条

[1]

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BAY, HL ;

OTTENBERGER, W .

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[3] SOME NEW RESULTS ON THE FABRICATION OF AND THE MECHANICAL, ELECTRICAL AND OPTICAL-PROPERTIES OF I-CARBON LAYERS [J].

ENKE, K .

THIN SOLID FILMS, 1981, 80 (1-3) :227-234

[4]

ERSOY E, 1983, THESIS U KOLN

[5]

Guarnieri C. R., 1980, IBM Technical Disclosure Bulletin, V23

[6] HYDROGEN CONTENT OF AMORPHOUS SILICON-CARBIDE PREPARED BY REACTIVE SPUTTERING - EFFECTS ON FILMS PROPERTIES [J].

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RICHARD, J ;

LECONTELLEC, M ;

LIGEON, E ;

FONTENILLE, J .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (04) :2167-2174

[7] SIC COATINGS FOR 1ST-WALL CANDIDATE MATERIALS BY RF SPUTTERING [J].

HIROHATA, Y ;

KOBAYASHI, M ;

MAEDA, S ;

NAKAMURA, K ;

MOHRI, M ;

WATANABE, K ;

YAMASHINA, T .

THIN SOLID FILMS, 1979, 63 (02) :237-242

[8]

LANDFORD WA, 1978, J APPL PHYS, V49, P2473

[9]

LECONTELLEC M, 1979, THIN SOLID FILMS, V58, P407, DOI 10.1016/0040-6090(79)90281-5

[10] SIC THIN-FILM THERMISTOR [J].

NAGAI, T ;

YAMAMOTO, K ;

KOBAYASHI, I .

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1982, 15 (05) :520-524

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