Multicusp sources for ion beam lithography applications

被引：9

作者：

Leung, KN

Herz, P

Kunkel, WB

Lee, Y

Perkins, L

Pickard, D

Sarstedt, M

Weber, M

Williams, MD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期

关键词：

D O I：

10.1116/1.588032

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Application of the multicusp source for ion projection lithography is described. It is shown that the Longitudinal energy spread of the positive ions at the extraction aperture can be reduced by employing a magnetic filter. The advantages of using volume-produced H- ions for ion beam lithography are also discussed. (C) 1995 American Vacuum Society.

引用

页码：2600 / 2602

页数：3

共 7 条

[1]

CHALUPKA A, 1994, UNPUB 38TH P INT S E

[2]

COOPER WS, 1974, UNPUB 2ND P S ION SO

[3] EFFECT OF A MAGNETIC FILTER ON HYDROGEN-ION SPECIES IN A MULTICUSP ION-SOURCE [J].