MICROSTRUCTURE DEVELOPMENT DURING THE THERMAL-OXIDATION OF SILICON IN CHLORINE CONTAINING AMBIENTS

被引：7

作者：

MONKOWSKI, MD ^{[1
]}

MONKOWSKI, JR ^{[1
]}

TSONG, IST ^{[1
]}

STACH, J ^{[1
]}

TRESSLER, RE ^{[1
]}

机构：

[1] PENN STATE UNIV,DEPT ELECT ENGN,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1982年 / 49卷 / 1-3期

关键词：

D O I：

10.1016/0022-3093(82)90119-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：201 / 207

页数：7

共 9 条

[1] STRUCTURE AND COMPOSITION OF SILICON-OXIDES GROWN IN HCI-O2 AMBIENTS [J].

MONKOWSKI, J ;

TRESSLER, RE ;

STACH, J .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (11) :1867-1873

[2] PHASE-SEPARATION AND SODIUM PASSIVATION IN SILICON-OXIDES GROWN IN HCI-O2 AMBIENTS [J].

MONKOWSKI, J ;

STACH, J ;

TRESSLER, RE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (07) :1129-1134

[3]

MONKOWSKI J, 1979, SOLID STATE TECHNOL, V22, P58

[4]

MONKOWSKI J, 1979, SOLID STATE TECH AUG, P113

[5]

MONKOWSKI JR, 1980, 30TH EL COMP C SF, P61

[6]

MONKOWSKI MD, 1981, CERAMIC CERAMIC META, P361

[7]

RAPP RA, 1976, P US JAPANESE SEMINA, pB1

[8] CHLORINE INCORPORATION IN HCL OXIDES [J].

ROHATGI, A ;

BUTLER, SR ;

FEIGL, FJ ;

KRANER, HW ;

JONES, KW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) :143-149

[9]

TSONG IST, 1980, PHYSICS MOS INSULATO, P321

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