A REACTIVE ION-BEAM ETCHING AND COATING SYSTEM

被引：10

作者：

ZHANG, YC

WU, YM

REN, CX

FU, XD

CHEN, GM

机构：

来源：

关键词：

D O I：

10.1016/0168-583X(85)90672-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：447 / 451

页数：5

共 6 条

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[2] SELECTIVE REACTIVE ION-BEAM ETCHING OF SIO2 OVER POLYCRYSTALLINE SI
HEATH, BA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (02) : 396 - 402
[3] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY
KAUFMAN, HR
CUOMO, JJ
HARPER, JME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736
[4] FOCUSED ION-BEAM DESIGNS FOR SPUTTER DEPOSITION
KAUFMAN, HR
HARPER, JME
CUOMO, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (03): : 899 - 905
[5] MATSUI S, 1980, JAPAN J APPL PHYS, V19, P463
[6] THOMPSON GR, 1978, SOLID STATE TECHNOL, V21, P73