SURFACE IMAGING BY SILYLATION FOR LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

被引：11

作者：

BOTTCHER, M ^{[1
]}

BAUCH, L ^{[1
]}

STOLBERG, I ^{[1
]}

机构：

[1] JENOPT TECHNOL GMBH,D-07739 JENA,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587534

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：3473 / 3477

页数：5

相关论文

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