SECONDARY-NEUTRAL MICROPROBE WITH ELECTRON-GAS POST-IONIZATION

被引:11
作者
BIECK, W
GNASER, H
OECHSNER, H
机构
[1] Institut für Oberflächen- und Schichtanalytik, Universität Kaiserslautern
关键词
D O I
10.1063/1.109872
中图分类号
O59 [应用物理学];
学科分类号
摘要
The essential features and the performance data of a recently developed secondary-neutral microprobe are described which interfaces the well-established technique of electron gas (plasma) post-ionization with a high-transmission magnetic sector mass spectrometer. Small-area analysis is accomplished by means of a separate high-brightness liquid-metal (Ga+) ion source. For 20 keV Ga+ ions and 1 nA beam current the intensities of post-ionized sputtered neutrals amount to some 10(3) counts/s for pure elements, and secondary neutral micrographs can be acquired with an image resolution in the mum range. Due to the high transmission of the mass spectrometer secondary-neutral intensities up to 10(9) counts/s per 1 mA primary current can be obtained in the direct bombardment mode (i.e., by extracting the sputtering beam out of the plasma), thus extending the detection limit down to the 10 ppb regime. Furthermore, the instrument can be operated at high mass resolution (M/DELTAM = 9500) providing the option of isotope analysis by means of secondary-neutral mass spectrometry.
引用
收藏
页码:845 / 847
页数:3
相关论文
共 18 条
[1]   NONRESONANT MULTIPHOTON IONIZATION AS A SENSITIVE DETECTOR OF SURFACE CONCENTRATIONS AND EVAPORATION RATES [J].
BECKER, CH ;
GILLEN, KT .
APPLIED PHYSICS LETTERS, 1984, 45 (10) :1063-1065
[2]  
BIECK W, 1992, DUNNSCHICHTTECHNOLOG, P759
[3]  
BIECK W, 1993, THESIS U KAISERSLAUT
[4]   ANALYSIS OF SOLIDS BY SECONDARY ION AND SPUTTERED NEUTRAL MASS-SPECTROMETRY [J].
GNASER, H ;
FLEISCHHAUER, J ;
HOFER, WO .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (04) :211-220
[5]   QUANTITATIVE DEPTH PROFILE AND BULK ANALYSIS WITH HIGH DYNAMIC-RANGE BY ELECTRON-GAS SPUTTERED NEUTRAL MASS-SPECTROMETRY [J].
JEDE, R ;
PETERS, H ;
DUNNEBIER, G ;
GANSCHOW, O ;
KAISER, U ;
SEIFERT, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2271-2279
[6]   CRITICAL ISSUES IN THE APPLICATION OF A GALLIUM PROBE TO HIGH-RESOLUTION SECONDARY ION IMAGING [J].
LEVISETTI, R ;
HALLEGOT, P ;
GIROD, C ;
CHABALA, JM ;
LI, J ;
SODONIS, A ;
WOLBACH, W .
SURFACE SCIENCE, 1991, 246 (1-3) :94-106
[7]  
MIGEON HN, 1986, SECONDARY ION MASS S, P155
[8]   HIGH SPATIAL-RESOLUTION CHEMICAL IMAGING OF SURFACES BY COMBINATION OF A FIELD-EMISSION ION GUN AND INTENSE LASER-RADIATION [J].
MOUNCEY, SP ;
MORO, L ;
BECKER, CH .
APPLIED SURFACE SCIENCE, 1991, 52 (1-2) :39-44
[9]  
MULLER KH, 1985, J VAC SCI TECHNOL A, V3, P1367, DOI 10.1116/1.572780
[10]  
OECHSNER H, 1988, SCANNING MICROSCOPY, V2, P9