AUTOMATIC-MEASUREMENT AND CORRECTION OF DEFLECTION ASTIGMATISM AND DEFOCUSING IN THE HEWLETT-PACKARD-605 ELECTRON-BEAM LITHOGRAPHY SYSTEM

被引:9
作者
OWEN, G
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
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D O I
10.1116/1.571169
中图分类号
O59 [应用物理学];
学科分类号
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页码:1064 / 1068
页数:5
相关论文
共 3 条
[1]  
CHU HC, 1981, 6TH P INT C MICR, P19
[2]  
KELLY J, 1981, HEWLETT-PACKARD J, V32, P14
[3]   E-BEAM WRITING TECHNIQUES FOR SEMICONDUCTOR-DEVICE FABRICATION [J].
VARNELL, GL ;
SPICER, DF ;
RODGER, AC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1048-1051