AUTOMATIC ELECTRON-BEAM METROLOGY SYSTEM FOR DEVELOPMENT OF VERY LARGE-SCALE INTEGRATED DEVICES

被引:5
作者
MATSUOKA, G
ICHIHASI, M
MURAKOSHI, H
YAMAMOTO, K
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词
D O I
10.1116/1.583932
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:79 / 83
页数:5
相关论文
共 8 条
[1]  
GRANT PW, 1985, SPIE P, V565, P169
[2]  
HASHIMOTO N, 1982, JPN J APPL PHYS, V21, P199, DOI 10.7567/JJAPS.21S1.199
[3]  
MAHER KS, 1985, SPIE, V565, P160
[4]   YAW CORRECTED PRECISION X-Y-STAGE FOR HIGH-THROUGHPUT ELECTRON-BEAM LITHOGRAPHY SYSTEMS [J].
MORIYAMA, S ;
OZASA, S ;
SAITOU, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :102-105
[5]   A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (SYSTEM-DESIGN) [J].
NAKAMURA, K ;
SAKITANI, Y ;
KONISHI, T ;
KOMODA, T ;
SAITOU, N ;
SUGAWARA, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :94-97
[6]  
NORTH T, 1985, SPIE, V565, P187
[7]  
NORVILLE R, 1985, SPIE, V565, P209
[8]  
OHTAKA T, 1985, SPIE P, V565, P205