共 8 条
[1]
GRANT PW, 1985, SPIE P, V565, P169
[2]
HASHIMOTO N, 1982, JPN J APPL PHYS, V21, P199, DOI 10.7567/JJAPS.21S1.199
[3]
MAHER KS, 1985, SPIE, V565, P160
[4]
YAW CORRECTED PRECISION X-Y-STAGE FOR HIGH-THROUGHPUT ELECTRON-BEAM LITHOGRAPHY SYSTEMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1985, 3 (01)
:102-105
[5]
A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (SYSTEM-DESIGN)
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1985, 3 (01)
:94-97
[6]
NORTH T, 1985, SPIE, V565, P187
[7]
NORVILLE R, 1985, SPIE, V565, P209
[8]
OHTAKA T, 1985, SPIE P, V565, P205