HIGH TEMPERATURE METALLOGRAPHIC MICROSCOPE STUDIES OF THE INITIAL OXIDATION OF TANTALUM

被引：26

作者：

KOFSTAD, P

KRUDTAA, OJ

机构：

来源：

JOURNAL OF THE LESS-COMMON METALS | 1963年 / 5卷 / 06期

关键词：

D O I：

10.1016/0022-5088(63)90061-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：477 / 492

页数：16

共 27 条

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[3] THE OXIDATION OF SPUTTERED TANTALUM FILMS [J].

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[4]

BRAUER G, 1958, PLANSEE P, P257

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BAKISH, R ;

NORTON, DR .

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[6]

CATHCART JV, COMMUNICATION

[7] THE EFFECT OF OXYGEN PRESSURE ON THE HIGH TEMPERATURE OXIDATION OF TANTALUM [J].

COWGILL, MG ;

STRINGER, J .

JOURNAL OF THE LESS-COMMON METALS, 1960, 2 (2-4) :233-240

[8]

GEBHARDT E, 1959, Z METALLKD, V50, P521

[9]

GEBHARDT E, 1959, Z METALLKD, V50, P248

[10] REACTIONS OF ZIRCONIUM, TITANIUM, COLUMBIUM, AND TANTALUM WITH THE GASES, OXYGEN, NITROGEN, AND HYDROGEN AT ELEVATED TEMPERATURES [J].

GULBRANSEN, EA ;

ANDREW, KF .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1949, 96 (06) :364-376

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