DIFFUSION AND RECRYSTALLIZATION PROCESSES DURING ANNEALING OF N+-IMPLANTED AND P+-IMPLANTED LINBO3

被引：11

作者：

JETSCHKE, S

HEHL, K

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1985年 / 88卷 / 01期

关键词：

D O I：

10.1002/pssa.2210880121

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：193 / 205

页数：13

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