ON THE PRIMARY PROCESS IN THE PLASMA-CHEMICAL AND PHOTOCHEMICAL VAPOR-DEPOSITION FROM SILANE - MECHANISM OF THE RADIATIVE SPECIES SIH](A2-DELTA) FORMATION

被引：19

作者：

OIKAWA, S

TSUDA, M

YOSHIDA, J

JISAI, Y

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1986年 / 85卷 / 05期

关键词：

D O I：

10.1063/1.451038

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：2808 / 2813

页数：6

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