PHOTOOXIDATION OF DIMETHYL SULFIDE AND DIMETHYL DISULFIDE .2. MECHANISM EVALUATION

被引：133

作者：

YIN, FD

GROSJEAN, D

FLAGAN, RC

SEINFELD, JH

机构：

[1] Department of Chemical Engineering, California Institute of Technology, Pasadena, 91125, CA

来源：

JOURNAL OF ATMOSPHERIC CHEMISTRY | 1990年 / 11卷 / 04期

关键词：

computer simulations; dimethyl disulfide; Dimethyl sulfide; outdoor smog chamber experiments; photooxidation mechanism;

D O I：

10.1007/BF00053781

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

The mechanisms for atmospheric photooxidation of CH3SCH3 and CH3SSCH3 developed in Part I are evaluated by a series of outdoor smog chamber experiments. Measured product yields, including SO2, H2SO4, CH3SO3H and HCHO, are reported. The predictions of the mechanisms developed in Part I are found to be in substantial agreement with the measured concentrations from the smog chamber. By comparison of mechanism predictions and observations, critical uncertainties in the mechanism are identified. © 1990 Kluwer Academic Publishers.

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页码：365 / 399

页数：35

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