A NEW X-RAY DIFFRACTOMETER DESIGN FOR THIN-FILM TEXTURE, STRAIN, AND PHASE CHARACTERIZATION

被引：62

作者：

FLINN, PA

WAYCHUNAS, GA

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

[2] STANFORD UNIV,CTR MAT RES,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584172

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1749 / 1755

页数：7

共 8 条

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BRANTLEY, WA
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[3] Cullity B. D, 1978, ELEMENTS XRAY DIFFRA, P451
[4] MEASUREMENT AND INTERPRETATION OF STRESS IN ALUMINUM-BASED METALLIZATION AS A FUNCTION OF THERMAL HISTORY
FLINN, PA
GARDNER, DS
NIX, WD
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (03) : 689 - 699
[5] JAMES MR, 1980, TREATISE MATERIALS A, V19, P1
[6] Klug H.P., 1974, XRAY DIFFRACTION PRO, V2nd
[7] SEGMUELLER A, 1988, TREATISE MATERIALS S, V27
[8] EINE EXPERIMENTELLE ANORDNUNG ZUR RONTGENBEUGUNG AN DUNNEN SCHICHTEN
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