CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES

被引：1075

作者：

BRANTLEY, WA ^{[1
]}

机构：

[1] BELL LABS, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 01期

关键词：

D O I：

10.1063/1.1661935

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：534 / 535

页数：2

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共 8 条

[1] ENHANCED X-RAY DIFFRACTION FROM SUBSTRATE CRYSTALS CONTAINING DISCONTINUOUS SURFACE FILMS
BLECH, IA
MEIERAN, ES
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (07) : 2913 - &
[2] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP
BRENNER, A
SENDEROFF, S
[J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123
[3] STRAIN EFFECTS AROUND PLANAR DIFFUSED STRUCTURES
FAIRFIELD, JM
SCHWUTTKE, GH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (04) : 415 - +
[4] MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE
JACCODINE, RJ
SCHLEGEL, WA
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) : 2429 - +
[5] Nye J. F., 1957, PHYSICAL PROPERTIES
[6] RESIDUAL THERMOELASTIC STRESSES IN BONDED SILICON WAFERS
RINEY, TD
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) : 454 - &
[7] SOKOLNIKOFF IS, 1939, ADVANCED CALCULUS, P321
[8] Analysis of bi-metal thermostats
Timoshenko, S
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA AND REVIEW OF SCIENTIFIC INSTRUMENTS, 1925, 11 (03): : 233 - 255