A LASER INTERFEROMETER SYSTEM TO MONITOR DRY ETCHING OF PATTERNED SILICON

[1] PLANARIZATION OF PHOSPHORUS-DOPED SILICON DIOXIDE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) : 423 - 429

[2] BONDAR JA, 1978, ELECTROCHEMICAL SOC, P760

[3] BUNYARD GB, 1977, SOLID STATE TECHNOL, V20, P53

[4] BUSTA HH, 1979, SOLID STATE TECHNOL, V22, P61

[5] STEP HEIGHT INTERFEROMETER WITH ONE NANOMETER RESOLUTION [J]. OPTICAL ENGINEERING, 1976, 15 (02) : 180 - 183

[6] A SIMPLE METHOD OF ENDPOINT DETERMINATION FOR PLASMA-ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1378 - 1381

[7] KLEINKNECHT HP, 1978, J ELECTROCHEM SOC, V125, P798, DOI 10.1149/1.2131551

[8] MARCOUX PJ, 1981, SOLID STATE TECHNOL, V24, P115

[9] POULSEN RG, 1977, SEMICONDUCTOR SILICO, P1058

[1] PLANARIZATION OF PHOSPHORUS-DOPED SILICON DIOXIDE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) : 423 - 429

[2] BONDAR JA, 1978, ELECTROCHEMICAL SOC, P760

[3] BUNYARD GB, 1977, SOLID STATE TECHNOL, V20, P53

[4] BUSTA HH, 1979, SOLID STATE TECHNOL, V22, P61

[5] STEP HEIGHT INTERFEROMETER WITH ONE NANOMETER RESOLUTION [J]. OPTICAL ENGINEERING, 1976, 15 (02) : 180 - 183

[6] A SIMPLE METHOD OF ENDPOINT DETERMINATION FOR PLASMA-ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1378 - 1381

[7] KLEINKNECHT HP, 1978, J ELECTROCHEM SOC, V125, P798, DOI 10.1149/1.2131551

[8] MARCOUX PJ, 1981, SOLID STATE TECHNOL, V24, P115

[9] POULSEN RG, 1977, SEMICONDUCTOR SILICO, P1058