A SIMPLE METHOD OF ENDPOINT DETERMINATION FOR PLASMA-ETCHING

被引：6

作者：

HITCHMAN, ML ^{[1
]}

EICHENBERGER, V ^{[1
]}

机构：

[1] RCA LABS LTD,BADENERSTR 569,CH-8042 ZURICH,SWITZERLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.570678

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1378 / 1381

页数：4

相关论文

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[1] BUNYARD GB, 1977, SOLID STATE TECHNOL, V20, P53
[2] BUSTA HH, 1979, SOLID STATE TECHNOL, V22, P61
[3] END-POINT DETERMINATION OF ALUMINUM CCL4 PLASMA ETCHING BY OPTICAL EMISSION-SPECTROSCOPY
CURTIS, BJ
BRUNNER, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (05) : 829 - 830
[4] CURTIS BJ, 1979, 4TH P INT S PLASM CH, P139
[5] SIMPLE OPTICAL-DEVICES FOR DETECTION OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF PHOTORESISTS
DEGENKOLB, EO
GRIFFITHS, JE
[J]. APPLIED SPECTROSCOPY, 1977, 31 (01) : 40 - 42
[6] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM
DEGENKOLB, EO
MOGAB, CJ
GOLDRICK, MR
GRIFFITHS, JE
[J]. APPLIED SPECTROSCOPY, 1976, 30 (05) : 520 - 527
[7] OPTICAL DETECTOR TO MONITOR PLASMA ETCHING
HARSHBARGER, WR
PORTER, RA
NORTON, P
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1978, 7 (03) : 429 - 440
[8] HARSHBARGER WR, 1977, APPL SPECTROSC, V31, P20
[9] ENDPOINT DETECTION IN PLASMA-ETCHING BY OPTICAL-EMISSION SPECTROSCOPY
HIROBE, K
TSUCHIMOTO, T
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 234 - 235
[10] POULSEN RG, 1977, SEMICONDUCTOR SILICO, P1058