ENDPOINT DETECTION IN PLASMA-ETCHING BY OPTICAL-EMISSION SPECTROSCOPY

被引：19

作者：

HIROBE, K

TSUCHIMOTO, T

机构：

来源：

关键词：

D O I：

10.1149/1.2129625

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：234 / 235

页数：2

共 6 条

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DEGENKOLB, EO
MOGAB, CJ
GOLDRICK, MR
GRIFFITHS, JE
[J]. APPLIED SPECTROSCOPY, 1976, 30 (05) : 520 - 527
[3] HARSHBARGER WR, 1976, KODAK MICROELECTRONI, P43
[4] NEW CHEMICAL DRY ETCHING
HORIIKE, Y
SHIBAGAKI, M
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 : 13 - 18
[5] PLASMA ETCHING IN INTEGRATED-CIRCUIT MANUFACTURE - REVIEW
POULSEN, RG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 266 - 274
[6] POULSEN RG, 1977, SEMICONDUCTOR SILICO, P1058