OXIDATION BEHAVIOR OF HOT-PRESSED SI3N4

被引:59
作者
KIEHLE, AJ [1 ]
HEUNG, LK [1 ]
GIELISSE, PJ [1 ]
ROCKETT, TJ [1 ]
机构
[1] UNIV RHODE ISLAND,KINGSTON,RI 02881
关键词
D O I
10.1111/j.1151-2916.1975.tb18972.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:17 / 20
页数:4
相关论文
共 11 条
[1]  
GIELISSE PJ, 1972, N00014680215008 OFF
[2]  
Godfrey D. J., 1968, Metals and Materials, V2, P305
[3]   OXIDATION KINETICS OF POWDERED SILICON NITRIDE [J].
HORTON, RM .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1969, 52 (03) :121-+
[4]  
KIEHLE AJ, 1973, THESIS U RHODE ISLAN
[5]  
Kingery WD, 1960, INTRO CERAMICS
[6]  
LANGE FF, 1972, AD738865 TECH REPT
[7]  
LYNCH JF, 1966, ENGINEERING PROPERTI
[8]  
McMurdie H. F, 1964, PHASE DIAGRAMS CERAM
[9]  
MILEK JT, 1971, HDB ELECTRONIC MAT 1, V3
[10]  
PARR NL, 1966, ENGINEER, V222, P18