THRESHOLD POWER-DENSITY MEASUREMENTS FOR ELECTRON-BEAM SUSTAINED DISCHARGE EXCITATION OF XEF AND KRF

被引：17

作者：

FISHER, CH ^{[1
]}

CENTER, RE ^{[1
]}

机构：

[1] MATH SCI NW INC,BELLEVUE,WA 98009

来源：

关键词：

D O I：

10.1063/1.89604

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：106 / 108

页数：3

共 6 条

[1] BERGER MJ, 1964, NASNRC1133 NAT AC SC
[2] BRAU CA, 1975, APPL PHYS LETT, V27, P437
[3] ATTACHMENT-DOMINATED ELECTRON-BEAM-IONIZED DISCHARGES
DAUGHERTY, JD
MANGANO, JA
JACOB, JH
[J]. APPLIED PHYSICS LETTERS, 1976, 28 (10) : 581 - 583
[4] KINETIC-MODEL OF XEBR RARE-GAS MONOHALIDE EXCIMER LASER
HART, GA
SEARLES, SK
[J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (05) : 2033 - 2036
[5] ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER
MANGANO, JA
JACOB, JH
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (09) : 495 - 498
[6] MANGANO JA, 1976, APPL PHYS LETT, V29, P427