GROWTH AND PHYSICAL-PROPERTIES OF LPCVD POLYCRYSTALLINE SILICON FILMS

被引:237
作者
HARBEKE, G [1 ]
KRAUSBAUER, L [1 ]
STEIGMEIER, EF [1 ]
WIDMER, AE [1 ]
KAPPERT, HF [1 ]
NEUGEBAUER, G [1 ]
机构
[1] UNIV DORTMUND,INST PHYS,D-4600 DORTMUND 50,FED REP GER
关键词
D O I
10.1149/1.2115672
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:675 / 682
页数:8
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