SPATIAL-FREQUENCY BANDWIDTH IN THE PHOTOLITHOGRAPHIC TRANSFER OF SUBMICRON GRATINGS

被引：7

作者：

PARRIAUX, O

VUILLIOMENET, H

SIXT, P

CUNY, N

机构：

[1] Cent. Suisse d'Electronique et de, Microtechnique SA, Neuchatel

来源：

OPTICAL ENGINEERING | 1995年 / 34卷 / 09期

关键词：

PHOTOLITHOGRAPHIC MASK TRANSFER; HIGH-SPATIAL-FREQUENCY GRATINGS;

D O I：

10.1117/12.200610

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The principle of the photolithographic mask transfer of high-spatial-frequency gratings under the Littrow angle is shown to be so tolerant that a broad spatial-frequency spectrum can be transferred under the same exposure conditions.

引用

页码：2657 / 2659

页数：3