CHEMICAL VAPOR-DEPOSITION OF BORON CARBIDES .1. PHASE AND CHEMICAL-COMPOSITION

[1] B-C SYSTEM IN KINETIC FORMATION RANGE - PYROLYTIC FORMATION OF CARBON-RICH B-C PHASES [J]. JOURNAL OF THE LESS-COMMON METALS, 1971, 23 (01): : 43 - +

[2] BARIN I, 1977, THERMOCHEMICAL PRO S

[3] Barin I., THERMOCHEMICAL PROPE

[4] BOUCHACOURT M, 1976, J LESS-COMMON MET, V47, P219

[5] CARLSSON JO, 1985, 8TH P INT C VAC MET, P257

[6] DUCARROIR M, 1975, 5TH P INT C CHEM VAP, P72

[7] EMIN D, COMMUNICATION

[8] AREA SELECTIVE CHEMICAL VAPOR-DEPOSITION OF BORON-CARBIDE ACHIEVED BY MOLECULAR MASKING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1733 - 1735

[9] CHEMICAL VAPOR-DEPOSITION OF BORON CARBIDES IN THE TEMPERATURE-RANGE 1300-1500-K AND AT A REDUCED PRESSURE [J]. THIN SOLID FILMS, 1985, 124 (02) : 101 - 107

[10] JANSSON U, UNPUB J VAC SCI TECH

[1] B-C SYSTEM IN KINETIC FORMATION RANGE - PYROLYTIC FORMATION OF CARBON-RICH B-C PHASES [J]. JOURNAL OF THE LESS-COMMON METALS, 1971, 23 (01): : 43 - +

[2] BARIN I, 1977, THERMOCHEMICAL PRO S

[3] Barin I., THERMOCHEMICAL PROPE

[4] BOUCHACOURT M, 1976, J LESS-COMMON MET, V47, P219

[5] CARLSSON JO, 1985, 8TH P INT C VAC MET, P257

[6] DUCARROIR M, 1975, 5TH P INT C CHEM VAP, P72

[7] EMIN D, COMMUNICATION

[8] AREA SELECTIVE CHEMICAL VAPOR-DEPOSITION OF BORON-CARBIDE ACHIEVED BY MOLECULAR MASKING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1733 - 1735

[9] CHEMICAL VAPOR-DEPOSITION OF BORON CARBIDES IN THE TEMPERATURE-RANGE 1300-1500-K AND AT A REDUCED PRESSURE [J]. THIN SOLID FILMS, 1985, 124 (02) : 101 - 107

[10] JANSSON U, UNPUB J VAC SCI TECH