AREA SELECTIVE CHEMICAL VAPOR-DEPOSITION OF BORON-CARBIDE ACHIEVED BY MOLECULAR MASKING

被引：14

作者：

JANSSON, U

CARLSSON, JO

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575281

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1733 / 1735

页数：3

共 5 条

[1] CHEMICAL VAPOR-DEPOSITION ON INERT AND REACTIVE SUBSTRATES - ASPECTS OF ADHESION, DEPOSITION RATE AND GRAIN-SIZE
BOMAN, M
CARLSSON, JO
[J]. SURFACE TECHNOLOGY, 1985, 24 (02): : 173 - 190
[2] SELECTIVE DEPOSITION OF TUNGSTEN - PREDICTION OF SELECTIVITY
CARLSSON, JO
BOMAN, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2298 - 2302
[3] CARLSSON JO, 1985, 8TH P INT C VACUUM M, P287
[4] INITIAL-STAGES OF GROWTH DURING BORON-CARBIDE CHEMICAL VAPOR-DEPOSITION
JANSSON, U
CARLSSON, JO
STRIDH, B
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (05): : 2823 - 2828
[5] REACTIVITY OF POLYCRYSTALLINE PLATINUM AND RHODIUM SURFACES TOWARDS METHANE, ETHENE AND CARBON-MONOXIDE
VANLANGEVELD, AD
VANDELFT, FCMJM
PONEC, V
[J]. SURFACE SCIENCE, 1983, 135 (1-3) : 93 - 109