INITIAL-STAGES OF GROWTH DURING BORON-CARBIDE CHEMICAL VAPOR-DEPOSITION

被引:13
作者
JANSSON, U [1 ]
CARLSSON, JO [1 ]
STRIDH, B [1 ]
机构
[1] UNIV UPPSALA,DEPT TECHNOL,S-75121 UPPSALA,SWEDEN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期
关键词
D O I
10.1116/1.574315
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2823 / 2828
页数:6
相关论文
共 7 条
[1]   CHEMICAL VAPOR-DEPOSITION ON INERT AND REACTIVE SUBSTRATES - ASPECTS OF ADHESION, DEPOSITION RATE AND GRAIN-SIZE [J].
BOMAN, M ;
CARLSSON, JO .
SURFACE TECHNOLOGY, 1985, 24 (02) :173-190
[2]  
CARLSSON JO, 1985, 8TH P INT C VACUUM M, P287
[3]   CHEMICAL VAPOR-DEPOSITION OF BORON CARBIDES IN THE TEMPERATURE-RANGE 1300-1500-K AND AT A REDUCED PRESSURE [J].
JANSSON, U ;
CARLSSON, JO .
THIN SOLID FILMS, 1985, 124 (02) :101-107
[4]  
JANSSON U, IN PRESS
[5]  
Moffatt W.G., 1981, HDB BINARY PHASE DIA
[6]   CATALYSIS AND SURFACE SCIENCE [J].
SOMORJAI, GA .
SURFACE SCIENCE, 1979, 89 (1-3) :496-524
[7]  
VANDENBULCKE L, 1975, 5TH P INT C CVD, P763