CHEMICAL VAPOR-DEPOSITION ON INERT AND REACTIVE SUBSTRATES - ASPECTS OF ADHESION, DEPOSITION RATE AND GRAIN-SIZE

被引:7
作者
BOMAN, M
CARLSSON, JO
机构
来源
SURFACE TECHNOLOGY | 1985年 / 24卷 / 02期
关键词
D O I
10.1016/0376-4583(85)90134-7
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:173 / 190
页数:18
相关论文
共 16 条
[1]  
Barin I., 1973, THERMOCHEMICAL PROPE
[2]   FACTORS AFFECTING ADHERENCE OF CHEMICALLY VAPOR-DEPOSITED COATINGS [J].
BRYANT, WA ;
MEIER, GH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :719-724
[3]  
BRYANT WA, 1970, 2ND P INT C CHEM VAP, P409
[4]  
CARLSSON J, UNPUB
[5]   MODELS FOR INTERPRETING DEPOSITION RATE DATA FROM A CLOSED CHEMICAL VAPOR-DEPOSITION SYSTEM [J].
CARLSSON, JO .
JOURNAL OF THE LESS-COMMON METALS, 1980, 71 (01) :15-32
[6]  
CARLSSON JO, 1977, CHEM SCRIPTA, V12, P51
[7]  
CARLSSON JO, 1984, 9TH P INT C CHEM VAP, P129
[8]  
FEDERER JI, 1972, 3RD P INT C CHEM VAP, P591
[9]  
GRUBER PE, 1970, 2ND P INT C CHEM VAP, P25
[10]  
Kubaschewski O., 1967, METALLURGICAL THERMO