ROLE OF ATOMIC BONDING FOR COMPOUND AND GLASS-FORMATION IN NI-SI PD-SI AND NI-B SYSTEMS

被引：57

作者：

TANAKA, K

SAITO, T

SUZUKI, K

HASEGAWA, R

机构：

[1] TOHOKU UNIV,IRON STEEL & OTHER MET RES INST,SENDAI,MIYAGI 980,JAPAN

[2] ALLIED CORP,CTR CORP RES & DEV,MORRISTOWN,NJ 07960

来源：

PHYSICAL REVIEW B | 1985年 / 32卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.32.6853

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6853 / 6860

页数：8

共 40 条

[1] TRANSITION-METAL SILICIDES - ASPECTS OF THE CHEMICAL-BOND AND TRENDS IN THE ELECTRONIC-STRUCTURE
BISI, O
CALANDRA, C
[J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1981, 14 (35): : 5479 - 5494
[2] SELF-CONSISTENT ENERGY-BANDS AND BONDING OF NI3SI
BYLANDER, DM
KLEINMAN, L
MEDNICK, K
[J]. PHYSICAL REVIEW B, 1982, 25 (02): : 1090 - 1095
[3] SELF-CONSISTENT ENERGY-BANDS AND BONDING OF NISI2
BYLANDER, DM
KLEINMAN, L
MEDNICK, K
GRISE, WR
[J]. PHYSICAL REVIEW B, 1982, 26 (12): : 6379 - 6383
[4] PHOTOEMISSION AND BAND-STRUCTURE RESULTS FOR NISI-2
CHABAL, YJ
HAMANN, DR
ROWE, JE
SCHLUTER, M
[J]. PHYSICAL REVIEW B, 1982, 25 (12): : 7598 - 7602
[5] ELECTRONIC-STRUCTURE OF NISI2
CHANG, YJ
ERSKINE, JL
[J]. PHYSICAL REVIEW B, 1982, 26 (12): : 7031 - 7034
[6] ROLE OF CHEMICAL BONDING IN METALLIC GLASSES
CHEN, HS
PARK, BK
[J]. ACTA METALLURGICA, 1973, 21 (04): : 395 - 400
[7] ON THE EVALUATION OF ABSORPTION DATA FROM SOFT-X-RAY SELF-ABSORPTION MEASUREMENTS
CRISP, RS
[J]. JOURNAL OF PHYSICS F-METAL PHYSICS, 1983, 13 (06): : 1325 - 1332
[8] ELLIOTT RP, 1965, CONSTITUTION BINAR S, P5430
[9] ELECTRONIC-STRUCTURE OF NICKEL SILICIDES NI2SI, NISI, AND NISI2
FRANCIOSI, A
WEAVER, JH
SCHMIDT, FA
[J]. PHYSICAL REVIEW B, 1982, 26 (02) : 546 - 553
[10] BULK SILICIDES AND SI-METAL INTERFACE REACTION - PD2SI
FRANCIOSI, A
WEAVER, JH
[J]. PHYSICAL REVIEW B, 1983, 27 (06) : 3554 - 3561